Ablation of polymethyl methacrylate films by pulsed (ns) ultraviolet and infrared (9.17 μm) lasers: A comparative study by ultrafast imaging

This publication has 26 references indexed in Scilit:

• Photokinetic etching of polymethyl methacrylate films by continuous wave ultraviolet laser radiation
  Journal of Applied Physics, 1991
• Devolatilization wave structures and temperatures for the pyrolysis of polymethylmethacrylate, ammonium perchlorate, and coal at combustion level heat fluxes
  Combustion and Flame, 1991
• The significance of a fluence threshold for ultraviolet laser ablation and etching of polymers
  Journal of Applied Physics, 1990
• Ultraviolet laser ablation of organic polymers
  Chemical Reviews, 1989
• Mechanism of Ultraviolet Laser Ablation of Organic Solids
  Physical Review Letters, 1988
• Evidence for the Thermal Nature of Laser-Induced Polymer Ablation
  Physical Review Letters, 1987
• Organic photochemistry with far-ultraviolet photons. The photochemistry of allyl-, vinyl-, and alkylidenecyclopropanes
  Accounts of Chemical Research, 1987
• Mechanism of the ultraviolet laser ablation of polymethyl methacrylate at 193 and 248 nm: laser-induced fluorescence analysis, chemical analysis, and doping studies
  Journal of the Optical Society of America B, 1986
• Photochemical cleavage of a polymeric solid: details of the ultraviolet laser ablation of poly(methyl methacrylate) at 193 nm and 248 nm
  Macromolecules, 1986
• A study of the thermal degradation of methyl methacrylate polymers and copolymers by thermal volatilization analysis
  European Polymer Journal, 1968