Weak interactions between deposited metal overlayers and organic functional groups of self-assembled monolayers

Publisher Website

1 December 1995

journal article
Published by Elsevier in Progress in Surface Science

Vol. 50 (1-4) , 103-129
https://doi.org/10.1016/0079-6816(95)00048-8

Abstract

No abstract available

Keywords

HS(CH2)LLCN MERCAPTOHEXADECANOIC ACID
HS(CH2) 1 5COOH MUA MERCAPTOUNDECANOIC ACID
HS(CH2)LOCOOH MUO MERCAPTOUNDECANOL
HS(CH2)LOOH NEXAFS NEAR-EDGE X-RAY ABSORPTION FINE STRUCTURE NREL NATIONAL RENEWABLE ENERGY LABORATORY ODT OCTADECANETHIOL
HS(CH2)17CH3 OFG ORGANIC FUNCTIONAL GROUP SAM SELF-ASSEMBLED MONOLAYER STM SCANNING TUNNELING MICROSCOPY UV ULTRAVIOLET XPS X-RAY PHOTOELECTRON SPECTROSCOPY XRD X-RAY DIFFRACTION

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