The effects of forming gas anneal on the electrical characteristics of ir-electroded BST thin film capacitors

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1 September 1997

journal article
Published by Taylor & Francis in Integrated Ferroelectrics

Vol. 17 (1-4) , 461-469
https://doi.org/10.1080/10584589708013020

Abstract

No abstract available

Keywords

This publication has 1 reference indexed in Scilit:

Deposition of extremely thin (Ba,Sr)TiO3 thin films for ultra-large-scale integrated dynamic random access memory application
Applied Physics Letters, 1995