An Algorithm for Optimization of Experimental Parameters for Maximum Uniformity of Film Thickness

1 May 1972

journal article
Published by American Vacuum Society in Journal of Vacuum Science and Technology

Vol. 9 (3) , 1104-1105
https://doi.org/10.1116/1.1316998

Abstract

A simple method for evaluating the geometrical parameters yielding maximum uniformity of film thickness on rotating substrates is described. The algorithm is based on numerical integration of the function for relative thickness. It is shown that maximum uniformity is obtained for a normalized source-to-substrate distance ratio of h/δ = 1.37.

Keywords

METHOD OF OPTIMIZATION THE RELATIVE THICKNESS DISTRIBUTION ON A ROTATING PLANAR SUBSTRATE FOR A SMALL AREA SURFACE SOURCE IS GIVEN BY
OPTIMIZATION PROBLEM
NUMERICAL INTEGRATION
THIN FILM

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