Enhancement of electron spectroscopy for chemical analysis of surface silanol in silicon nitride through chemical derivatization

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Abstract
The surface silanol on Si3N4 can be successfully determined by reaction of the OH group with tridecafluoro–1,1,2,2–tetrahydrooctyl–1–1–trichlorosilane and subsequent electron spectroscopy for chemical analysis for F. The technique offers both specificity and very high sensitivity. It also has certain advantages over diffuse reflectance infrared Fourier transform, including more surface probing, better quantification, and a significantly lower detection limit.

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