Chemical Etching of Si1 − x Ge x in HF : H 2 O 2 : CH 3 COOH

• 1 April 1995
• journal article
• Published by The Electrochemical Society in Journal of the Electrochemical Society
• Vol. 142  (4) , 1260-1266
• https://doi.org/10.1149/1.2044161

Abstract