Formation of intrinsic oxide layers by ion implantation of silicon and titanium in the low kiloelectronvolt regime

This publication has 6 references indexed in Scilit:

• Recent trends in surface treatment using ion beam processes
  Vacuum, 1987
• Calculation of projected ranges — analytical solutions and a simple general algorithm
  Nuclear Instruments and Methods, 1981
• The influence of bombardment conditions upon the sputtering and secondary ion yields of silicon
  Applications of Surface Science, 1981
• Phase separation in silicon oxides as seen by Auger electron spectroscopy
  Applied Physics Letters, 1975
• Electron cyclotron wave resonances and power absorption effects in electrodeless low pressure h.f. plasmas with a superimposed static magnetic field
  Plasma Physics, 1974
• Untersuchungen zur Festkörperzerstäubung bei schiefwinkligem Ionenbeschuß polykristalliner Metalloberflächen im Energiebereich um 1 keV
  The European Physical Journal A, 1973