Silicide Technology in Deep Submicron Regime
- 1 January 1998
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Formation of epitaxial CoSi2 films on (001) silicon using Ti-Co alloy and bimetal source materialsJournal of Applied Physics, 1991
- IntroductionPublished by Elsevier ,1983