Nanoscale silicon prepared on different substrates using electron-beam evaporation and their field-emission property
- 4 June 2003
- journal article
- research article
- Published by Elsevier in Applied Surface Science
- Vol. 217 (1) , 39-42
- https://doi.org/10.1016/s0169-4332(03)00561-0
Abstract
No abstract availableKeywords
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