Scattering rates for holes near the valence-band edge in semiconductors
- 15 June 1990
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 67 (12) , 7373-7382
- https://doi.org/10.1063/1.344524
Abstract
In this paper, we discuss and compare the rates for dominant scattering mechanisms for holes in semiconductors, including ionized impurity scattering, polar and nonpolar optical-phonon scattering, and inelastic acoustic deformation potential scattering. The scattering rates for these mechanisms have been reviewed for the purpose of finding reliable expressions to be used in Monte Carlo simulation of hole transport in p-type III-V semiconductor devices. In the scarce literature on hole scattering rates, we have found several discrepancies. Here, we present corrected rates for ionized impurity scattering and for scattering by polar optical phonons. In addition, we have derived new expressions for the inelastic acoustic deformation potential scattering rates where we also have included a series expansion for the phonon occupation number, beyond the equipartition approximation.This publication has 7 references indexed in Scilit:
- Quantum-well p-channel AlGaAs/InGaAs/GaAs heterostructure insulated-gate field-effect transistorsIEEE Transactions on Electron Devices, 1989
- p-channel, strained quantum well, field-effect transistorApplied Physics Letters, 1986
- Monte Carlo calculations of electron transport in GaAs/AlGaAs superlatticesSuperlattices and Microstructures, 1985
- Theory of high-field transport of holes in GaAs and InPPhysical Review B, 1984
- Electron drift velocity in siliconPhysical Review B, 1975
- Scattering probabilities for holes. II. Polar optical scattering mechanismPhysica Status Solidi (b), 1973
- Scattering Probabilities for Holes I. Deformation Potential and Ionized Impurity Scattering MechanismsPhysica Status Solidi (b), 1973