Fabrication of nanostructures using a UV-based imprint technique
- 30 June 2000
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 53 (1-4) , 233-236
- https://doi.org/10.1016/s0167-9317(00)00304-x
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Sub-10 nm imprint lithography and applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Nanoimprint lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Imprint of sub-25 nm vias and trenches in polymersApplied Physics Letters, 1995