Gaseous Thermal Electron Reactions: Attachment to SF6 and C7F14

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Abstract
The rates of attachment of thermal gaseous electrons to sulfur hexafluoride and perfluoromethylcyclohexane have been measured using a microwave cavity resonance technique. The measurements are compared to the results of recent electron‐beam work. The rate constants for attachment to SF6 and C7F14 are, respectively, 3.1×10−7 and 9.8×10−8 cc/molecule·sec. The former rate constant decreases and the latter slightly increases as the electron temperature is raised.

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