Birefringence reduction in side-written photoinduced fiber devices by a dual-exposure method

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Abstract
An in situ birefringence measurement in conjunction with an atomic force microscope study shows that the geometric asymmetry of the side-writing process is a major cause of the induced birefringence in grating-based fiber devices. Measured refractive-index profiles of UV-exposed fibers clearly show the asymmetry in the induced index change. We demonstrate the use of a dual-exposure technique for producing low-birefringence devices.