ISFET's using inorganic gate thin films
- 1 December 1979
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 26 (12) , 1939-1944
- https://doi.org/10.1109/t-ed.1979.19799
Abstract
The characteristics of various types of ISFET's using inorganic gate films are described. The pH and pNa selectivities are investigated for SiO2, Si3N4, Al2O3, alumino-silicate, and sodium-aluminosilicate gate dielectrics. The transient response and device stability are also studied for different values of solution pH. The Al2O3gate shows a nearly ideal pH response, excellent stability, and selectivity to other cations. On the other hand, the Si3N4gate is also a good pH sensor, but it is proved by the studies of SiO2and SiOxNyfilms that the oxygen content in its surface degrades its properties as a pH sensor. Sodium-alumino-silicate, which is generally known as a material for pNa selective glass electrodes, is utilized as a gate film for the pNa ISFET. The pNa selectivity of this device is comparable to that of the conventional glass electrode. The alumino-silicate gate has also a pNa selectivity, but it is inferior to the sodium-alumino-silicate gate.Keywords
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