Removing native oxide from Si(001) surfaces using photoexcited fluorine gas
- 11 November 1991
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 59 (20) , 2576-2578
- https://doi.org/10.1063/1.105930
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Heavy Boron Doping in Low‐Temperature Si PhotoepitaxyJournal of the Electrochemical Society, 1990
- Gas-phase selective etching of native oxideIEEE Transactions on Electron Devices, 1990
- Polycrystalline SiC for a Wide‐Bandgap Emitter of Si‐HBTsJournal of the Electrochemical Society, 1989