Microstructure of CuInS2films prepared by sulfuration of Cu–In–O films

Abstract
Polycrystalline CuInS2thin films are prepared by sulfuration of Cu–In–O films. The Cu–In–O films are deposited from a sintered Cu2In2O5target by using a pulsed laser deposition (PLD) method. Then, the Cu–In–O films are converted into CuInS2films by means of a subsequent annealing in an H2S gas atmosphere. The characteristics of the films are determined by using an x-ray diffractometer (XRD), an energy dispersive x-ray spectrometer (EDX), and a scanning electron microscope (SEM). The effects of the deposition and sulfuration temperatures of the Cu–In–O films on the structural and microstructural properties of CuInS2films are examined experimentally. Single-phase CuInS2films with a chalcopyrite structure are obtained when Cu–In–O films are sulfurated at a temperature higher than 400 °C. Grain size of CuInS2is larger when a lower deposition temperature and a higher sulfuration temperature of Cu–In–O films are employed.