Pre‐Oxidation Fluorine Implantation into Si: Process‐Related MOS Characteristics
- 1 January 1992
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 139 (1) , 238-241
- https://doi.org/10.1149/1.2069176
Abstract
No abstract availableThis publication has 0 references indexed in Scilit: