Evidence for SiH4 Formation during the Reaction of Water with a Silicon Surface
- 1 July 1986
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 133 (7) , 1472-1474
- https://doi.org/10.1149/1.2108937
Abstract
During the reaction of freshly cleaved, etched, or polished silicon surfaces with water vapor, monosilane, , is formed as a side product in the parts per million range. is identified by its reducing ability, its decomposition reaction in alkaline solution and its characteristic infrared‐absorption spectrum. is found to be responsible for the photographic film darkening reactions observed with silicon surfaces by various authors.Keywords
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