In Situ Wafer Emissivity Variation Measurement in a Rapid Thermal Processor
- 1 January 1991
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Rapid thermal processing systems: A review with emphasis on temperature controlJournal of Vacuum Science & Technology B, 1990
- Multi-wavelength radiation pyrometry where reflectance is measured to estimate emissivityJournal of Physics E: Scientific Instruments, 1980
- Directional Reflectance and Emissivity of an Opaque SurfaceApplied Optics, 1965