The effect of the substrate temperature on the optical properties of reactively evaporated silicon oxide films
- 1 May 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 42 (3) , 361-367
- https://doi.org/10.1016/0040-6090(77)90371-6
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
- The optical properties of evaporated silicon oxide filmsThin Solid Films, 1972
- Charge storage in evaporated silicon oxide filmsThin Solid Films, 1970
- Solar Absorptivity and Thermal Emissivity of Aluminum Coated with Silicon Oxide Films Prepared by Evaporation of Silicon MonoxideApplied Optics, 1970
- Influence of Substrate Temperature on the Condensation of Vacuum Evaporated Films of MgF2 and ZnSJournal of Vacuum Science and Technology, 1969
- Effects of Ultraviolet Irradiation on the Properties of Evaporated Silicon Oxide FilmsJournal of Applied Physics, 1968
- The structure of evaporated silicon oxide films and its effect on the electrical and optical propertiesThin Solid Films, 1968
- Deposition of Oxide Films by Reactive EvaporationJournal of Vacuum Science and Technology, 1966
- Increasing the Far-Ultraviolet Reflectance of Silicon-Oxide-Protected Aluminum Mirrors by Ultraviolet IrradiationJournal of the Optical Society of America, 1963
- Herstellung und Analyse von SiO-Aufdampfschichten verschiedener optischer EigenschaftenMonatshefte für Chemie / Chemical Monthly, 1962
- Optical Properties of Silicon Monoxide in the Wavelength Region from 024 to 140 Microns*Journal of the Optical Society of America, 1954