Direct high-resolution excimer laser photoetching
- 1 March 1984
- journal article
- Published by Springer Nature in Applied Physics A
- Vol. 33 (3) , 195-198
- https://doi.org/10.1007/bf00618755
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Ablative photodecomposition: action of far-ultraviolet (193 nm) laser radiation on poly(ethylene terephthalate) filmsJournal of the American Chemical Society, 1982
- Self-developing photoetching of poly(ethylene terephthalate) films by far-ultraviolet excimer laser radiationApplied Physics Letters, 1982
- Ultrafast deep UV Lithography with excimer lasersIEEE Electron Device Letters, 1982
- Deep uv lithographyJournal of Vacuum Science and Technology, 1975