Single-crystalline, single-domain epitaxy of PbTiO3 thin films by metalorganic chemical vapor deposition

4 December 1995

journal article
research article
Published by AIP Publishing in Applied Physics Letters

Vol. 67 (23) , 3503-3505
https://doi.org/10.1063/1.115261

Abstract

Single‐crystalline and single‐domain PbTiO3films with thickness of 3000 Å have been prepared by metalorganic chemical vapor deposition(MOCVD), using metalorganic precursors of tetra‐ethyl‐lead and iso‐propoxide titanium. The nature of single‐crystalline epitaxy and single domain of as‐grown films was characterized by x‐ray diffraction(XRD), synchrotron radiation (SR), and Rutherford backscattering(RBS). Using atomic force microscopy(AFM), the evidence of layer‐by‐layer growth was observed. The growth steps on the surface may be attributable to the formation of single‐crystalline and single‐domain PbTiO3film with 3000‐Å thickness.

Keywords

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