High contrast synchrotron x-ray lithography by means of silicon based masks and magnesium beam windows
- 1 December 1985
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 3 (1-4) , 581-588
- https://doi.org/10.1016/0167-9317(85)90071-1
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Design and performance of an x-ray lithography beam line at a storage ringJournal of Vacuum Science & Technology B, 1983
- Computer simulations of resist profiles in x-ray lithographyJournal of Vacuum Science and Technology, 1981