A model for uv preionization in electric-discharge-pumped XeF and KrF lasers
- 15 January 1977
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 30 (2) , 101-103
- https://doi.org/10.1063/1.89304
Abstract
A mechanism is proposed to explain the improvement in discharge uniformity observed in pure electric‐discharge‐pumped rare‐gas halide lasers when a uv preionizer is used to precondition the laser medium. In the model the F− ions formed by dissociative attachment following uv photoionization act as a reservoir from which electrons are easily released when the main discharge field is applied. The model shows that a time delay is required between the application of the uv and the main discharge, and also that the effect of the preionizer can last some tens of microseconds despite the large electron attachment rates in the laser mixture.Keywords
This publication has 3 references indexed in Scilit:
- Performance of XeF/KrF lasers pumped by fast dischargesApplied Physics Letters, 1976
- Efficient electric discharge lasers in XeF and KrFApplied Physics Letters, 1976
- On the Motion of Gaseous Ions in a Strong Electric Field. IPhysical Review B, 1951