The interrelationship between internal stress, processing parameters and microstructure of physically vapour deposited and thermally sprayed coatings
- 1 November 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 154 (1-2) , 125-141
- https://doi.org/10.1016/0040-6090(87)90358-0
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Internal stress and adherence of titanium nitride coatingsJournal of Vacuum Science & Technology A, 1986
- Impurity effects in magnetron sputter deposited tungsten filmsJournal of Vacuum Science & Technology B, 1986
- Microstructure evolution in TiN films reactively sputter deposited on multiphase substratesJournal of Vacuum Science & Technology A, 1986
- Residual stress measurement of refractory coatings as a nondestructive evaluationJournal of Materials for Energy Systems, 1985
- An energy approach to the adhesion of coatings using the scratch testThin Solid Films, 1984
- A model for the thermal conductivity of plasma-sprayed ceramic coatingsThin Solid Films, 1984
- Glow discharge sputteringProgress in Surface Science, 1976
- High absorptivity solar absorbing coatingsJournal of Vacuum Science and Technology, 1974
- Fundamentals of Ion PlatingJournal of Vacuum Science and Technology, 1973