Laser-induced damage resistance of thin-film polarizers prepared by ion-assisted deposition
- 15 January 1994
- journal article
- Published by Optica Publishing Group in Optics Letters
- Vol. 19 (2) , 81-83
- https://doi.org/10.1364/ol.19.000081
Abstract
An investigation of the effects of ion-assisted deposition on the laser-induced damage threshold of thin-film polarizers has been carried out. It shows that the laser-induced damage threshold of polarizers with 50–100-eV oxygen-ion bombardment during deposition is improved considerably.Keywords
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