Li diffusion in Ti oxyfluoride films: Thermal activation energy and jump length derived from impedance spectroscopy
- 15 August 1996
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 80 (4) , 2169-2174
- https://doi.org/10.1063/1.363108
Abstract
Li ions were electrochemically intercalated into sputtered Ti oxyfluoride films. The process was found to be thermally activated with an activation energy depending on the amount of intercalated Li and decreasing with increasing Li content. The chemical diffusion coefficient was thermally activated as well with an activation energy of ∼0.5 eV independent of the amount of intercalated Li. The origin of the activation energy was discussed in terms of the Anderson–Stuart model. It was found likely that strain energy is needed to open up ‘‘doorways’’ in the Ti oxyfluoride structure to allow Li ion transport. The jump length for the Li ions inside the Ti oxyfluoride was estimated to lie in the 4–8 Å interval.This publication has 18 references indexed in Scilit:
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