High-speed spectral ellipsometry for in situ diagnostics and process control

• 1 July 1994
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 12  (4) , 2779-2784
• https://doi.org/10.1116/1.587191

Abstract

Keywords

• PROCESS CONTROL