Electron beam nanolithography with image reversal by ECR plasma oxidation
- 4 February 1995
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 27 (1-4) , 125-128
- https://doi.org/10.1016/0167-9317(94)00071-2
Abstract
No abstract availableKeywords
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- Low Temperature Oxidation of Silicon in a Microwave‐Discharged Oxygen PlasmaJournal of the Electrochemical Society, 1985
- Local plasma oxidation and reactive ion etching of metal films for ultrafine line pattern inversion and transferJournal of Vacuum Science & Technology B, 1983