Poly(tetraflouro-p-xylylene), a low dielectric constant chemical vapor polymerized polymer
- 12 January 1998
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 72 (2) , 258-260
- https://doi.org/10.1063/1.120703
Abstract
A low dielectric constant polymer, poly(tetrafluoro-p-xylylene) (VT-4) was synthesized by a chemical vapor polymerization process using 4,5,7,8,12,13,15,16-octafluoro-[2.2]-paracyclophane as a precursor. The VT-4 polymer has a dielectric constant of 2.42 and a dielectric loss of 0.008 at 1 MHz, perpendicular to the plane of the film. Thermal stability of VT-4 satisfied the SEMATECH criteria, exhibiting an onset of degradation at 460 °C, and 1% weight loss at 480 °C in an argon environment. The x-ray diffraction data suggest a disordered semicrystalline polymer as-deposited (at ∼12 °C). The crystalline phase became more ordered due to a decrease in the d spacing from 4.850 to 4.594 Å and an increase in the percent crystallinity from 39% as-deposited to 66% after successive postdeposition anneals to 300 °C. Optical measurements showed a highly anisotropic thin film with ne @630 nm=1.601 and n0 @630 nm=1.471, progressively becoming more negatively birefringent after postdeposition anneals, reaching a plateau at ∼250 °C, due to the polymer chain becoming more conformationally ordered.Keywords
This publication has 9 references indexed in Scilit:
- A new method for fabricating high performance polymeric thin films by chemical vapor polymerizationJournal of Materials Research, 1996
- Optical properties of polymeric thin films grown by chemical vapor depositionJournal of Materials Research, 1996
- Synthesis of functional substituted polycarbosilanes based on silyltriflate derivativesJournal of Polymer Science Part A: Polymer Chemistry, 1995
- Room temperature copolymerization to improve the thermal and dielectric properties of polyxylylene thin films by chemical vapor depositionJournal of Materials Research, 1994
- Vapor deposition of parylene-F by pyrolysis of dibromotetrafluoro-p-xyleneJournal of Vacuum Science & Technology A, 1993
- α α′ α″ α‴ Poly-tetrafluoro-p-xylylene as an interlayer dielectric for thin film multichip modules and integrated circuitsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993
- Vapor Deposition of Parylene Films from PrecursorsMRS Proceedings, 1992
- Stress in Thermally Annealed Parylene FilmsMRS Proceedings, 1991
- Molecular packing in alkylated and chlorinated poly-p-xylylenesPolymer, 1984