Chemical vapor deposition of thin films of ruthenium and formation of an unexpected byproduct using hexafluoro-2-butynetetracarbonylruthenium(0)
- 1 July 1992
- journal article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 4 (4) , 747-749
- https://doi.org/10.1021/cm00022a002
Abstract
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