Stoichiometry and Masking Ability of LPCVD Silicon Nitride Against Arsenic Diffusion
- 1 October 1980
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 127 (10) , 2239-2242
- https://doi.org/10.1149/1.2129383
Abstract
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