High energy implantation of buried insulating layers
- 1 January 1980
- journal article
- research article
- Published by Taylor & Francis in Radiation Effects
- Vol. 47 (1-4) , 217-220
- https://doi.org/10.1080/00337578008209213
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Dielectric isolation techniques for integrated circuitsMicroelectronics Reliability, 1976
- MOS and vertical junction device characteristics of epitaxial silicon on low aluminum-rich spinelSolid-State Electronics, 1970