Vapor Deposition by Liquid Phase Sputtering

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Abstract
Liquid binary alloy targets have been sputtered at ion densities of up to 100 W/cm2 providing deposition rates in excess of 10 mils/h in a combined sputtering-evaporation mode. At high power densities a serf-sputtering mode has been demonstrated which allows deposition from 10−7 to 10−2 Torr. Comparison of sputtered deposit compositions of Pb-24 In, Fe-30 V and Fe-32 Ni with theoretical molar ratios predicted on the basis of thermal vaporization shows that alloy fractionation is substantially reduced. The composition of deposits from solid or liquid Pb-24 In targets had nearly the same Pb/In ratio, 5.8 (target ratio = 1.75) although the predicted ratio for thermalized vapor was 1300. For Fe-30 V liquid targets where less than 0.5% vanadium is predicted from thermal vaporization alone, a sputtered deposit containing 10.3% vanadium was found, suggesting that the approximate sputtering/evaporation ratio is 0.3. Liquid phase targets of Fe-32 Ni alloy had average molar ratios of Fe/Ni close to 3 (target ratio was 2.2), whereas the predicted ratio from thermal vaporization was 5.8. There was only a slight increase in Fe/Ni ratio in the self-sputtering mode at 10−6 Torr over that obtained with argon sputtering at 10−3 Torr.

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