Vapour-phase oxidation of diamond surfaces in O2 studied by diffuse reflectance Fourier-transform infrared and temperture-programmed desorption spectroscopy
- 1 January 1993
- journal article
- research article
- Published by Royal Society of Chemistry (RSC) in Journal of the Chemical Society, Faraday Transactions
- Vol. 89 (19) , 3635-3640
- https://doi.org/10.1039/ft9938903635
Abstract
Thermal oxidizing treatments of hydrogenated diamond surfaces have been performed in an O2 environment. Chemisorption of oxygen on diamond surfaces has been investigated by diffuse reflectance Fourier-transform infrared (FTIR), temperature-programmed desorption (TPD), temperature-programmed reaction (TPR) and thermogravimetry (TG). Oxidation of the hydrogenated diamond occurred above 300 °C and diamond started to burn out above 480 °C in 20% O2. Diffuse reflectance FTIR spectra indicated that the oxidation gave species containing CO and C—O—C structures on the diamond surface above 300 °C. The structures of the chemisorbed species changed with the oxidation temperature. The maximum coverage of oxygen was obtained between 480 and 500 °C. TPD spectra of oxidized diamond indicated that the oxygen-containing species were desorbed as CO and CO2 above 480 °C. This paper deals with the mechanistic considerations for the oxidation of diamond surfaces.Keywords
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