dc magnetron system for cathode sputtering
- 1 January 1976
- Vol. 26 (6) , 237-241
- https://doi.org/10.1016/s0042-207x(76)80483-6
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Electron effects in sputtering and cosputteringJournal of Applied Physics, 1974
- Plasma Diagnostics and Energy Transport of a dc Discharge Used for SputteringJournal of Applied Physics, 1972
- Temperature Rise during Film Deposition by rf and dc SputteringJournal of Vacuum Science and Technology, 1972
- Control of Film Properties by rf-Sputtering TechniquesJournal of Vacuum Science and Technology, 1971
- Sputtering Multilayered Conductor FilmsJournal of Vacuum Science and Technology, 1971
- A Novel Diode Sputter-Ion PumpJournal of Vacuum Science and Technology, 1969
- Substrate Bombardment During RF SputteringJournal of Vacuum Science and Technology, 1969
- A radio frequency dielectric sputtering system with non-grounded electrodesJournal of Physics E: Scientific Instruments, 1968
- Efficient Low Pressure Sputtering in a Large Inverted Magnetron Suitable for Film SynthesisReview of Scientific Instruments, 1965
- Magnetic Field Effects on an Abnormal Truncated Glow Discharge and Their Relation to Sputtered Thin-Film GrowthJournal of Applied Physics, 1963