X-Ray Photoelectron Spectroscopy of Micrometer-Size Surface Area Using Synchrotron Radiation

Abstract
An axisymmetric Wolter type I mirror was used at a synchrotron radiation beamline in order to produce a focused X-ray beam with a photon energy of 150 eV. An FWHM (full width at half maximum) of 4 µm was achieved in the beam intensity profile. A Si(2p) XPS spectrum was then observed for a Si sample with this focused beam. This is the first microscopic XPS measurement in the micrometer range that has been achieved using a Wolter type mirror.