The determination of oxygen in silicon by alpha and helium-3 activation analysis
- 1 July 1974
- journal article
- Published by Elsevier in Analytica Chimica Acta
- Vol. 71 (1) , 67-77
- https://doi.org/10.1016/s0003-2670(01)82871-3
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Determination of oxygen in gallium phosphide and silicon by helium-3 activationAnalytica Chimica Acta, 1971
- A possible problem in determining oxygen in silicon by fast neutron activation analysisJournal of Inorganic and Nuclear Chemistry, 1971
- Contribution a l’etude de la determination de Be, B, C, N, O et F par activation Au moyen de p, d,3He et αJournal of Radioanalytical and Nuclear Chemistry, 1971
- Reactions parasites rencontrees lors du dosage de l’oxygene dans le silicium au moyen des particules alphaJournal of Radioanalytical and Nuclear Chemistry, 1970
- Determination of oxygen in silicon in the sub-part-per-million range by charged-particle activation analysisAnalytical Chemistry, 1970
- Charged particle activation analysis for carbon, nitrogen and oxygen in semiconductor siliconJournal of Radioanalytical and Nuclear Chemistry, 1970
- Ultratrace determination of oxygen and carbon by charged particle activation analysisAnalytical Chemistry, 1969
- Chemical etching procedure used to remove surface oxygen contamination in charged-particle activation analysisAnalytical Chemistry, 1968
- Determination of oxygen content in germanium and silicon by activation with He3 ionsAtomic Energy, 1967
- Oxygen Content of Silicon Single CrystalsJournal of Applied Physics, 1957