Evaluation of the Outgassing from Resists at the EUV Wavelength.

• 1 January 2001
• journal article
• Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
• Vol. 14  (4) , 561-565
• https://doi.org/10.2494/photopolymer.14.561

Abstract

Keywords

• OUTGASSING FROM RESISTS
• EVALUATION OF THE OUTGASSING
• RESISTS AT THE EUV WAVELENGTH