Ion beam etching in palynology

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Abstract
The application of the ion beam etching technique to palynology is described and discussed. Using the technique, structures at different levels in the exine can be exposed for study by scanning electron microscopy. The results obtained vary with the type of pollen and in some cases the grains are unevenly eroded and artifacts produced. In others the tectum may be eroded and the columellae exposed without excessive damage. The results are then comparable to those obtainable at certain levels of focus in light microscopy but with the advantages of higher resolution and the type of image obtained by scanning electron microscopy.

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