Highly-sensitive novolak-based positive X-ray resist
- 31 December 1986
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 5 (1-4) , 97-104
- https://doi.org/10.1016/0167-9317(86)90035-3
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- The Resist Technique—A Chemical Contribution to ElectronicsAngewandte Chemie International Edition in English, 1982