High resolution techniques for the fabrication of small area Josephson tunnel junctions
- 1 November 1981
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 28 (11) , 1382-1385
- https://doi.org/10.1109/t-ed.1981.20618
Abstract
Superconducting tunnel junction devices as small as 10-10cm2have been made using novel self-aligning techniques in conjunction with optical or e-beam lithography. This process has been used to fabricate complete circuits and multijunction arrays under well controlled conditions, using a single resist patterning step.Keywords
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