Balanced Inductive Plasma Sources
- 1 September 1996
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 35 (9A) , L1130-1133
- https://doi.org/10.1143/jjap.35.l1130
Abstract
An approach is proposed for the design of powerful inductive sources with internally compensated anti-phase RF capacitive currents. It is shown that the total internal balance of both capacitive currents and RF magnetic field exist in a full wave helical resonator source. The new plasma source exhibits peculiar plasma phenomena having a clear physical interpretation.Keywords
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