Light‐Localized Deposition of Electroconductive Polymers on n‐Type Silicon by Utilizing Semiconductor Photocatalysis

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Abstract
Comparative studies were made for light‐localized electrolytic deposition of polypyrrole and polythiophene on n‐type Si wafers to investigate factors which influence the deposited polymer pattern resolution. It was found that the quantity of electricity, light intensities, and electrode potentials greatly influenced the resolution of light‐localized deposits of these polymers. The polymer pattern production on the n‐type Si wafers by utilizing semiconductor photocatalysis was successfully achieved in acetonitrile containing a monomer (α‐terthienyl or pyrrole) and under the condition that the illuminated front surface was polished to mirror finish and the back surface was heavily damaged. A good light‐localized polymer deposition was obtained for polythiophene under a relatively low illumination intensity.

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