Interfaces formed by evaporation of Si on Ni and Mo surfaces
- 3 October 1985
- journal article
- Published by Elsevier in Surface Science
- Vol. 162 (1-3) , 651-656
- https://doi.org/10.1016/0039-6028(85)90962-8
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Evidence for a modulated ordering in the intermetallic compounds TbGe0,2Si0,8 and ErSi of CrB-typeJournal de Physique, 1984
- XPS Investigation of Ni/Si(111) InterfacesPhysica Scripta, 1983
- Static Charge Fluctuations in Amorphous SiliconPhysical Review Letters, 1982
- Electronic structure of nickel silicidesSi, NiSi, and NiPhysical Review B, 1982
- Chemical bonding and charge redistribution: Valence band and core level correlations for the Ni/Si, Pd/Si, and Pt/Si systemsJournal of Vacuum Science and Technology, 1982
- Quantitative chemical analysis by ESCAJournal of Electron Spectroscopy and Related Phenomena, 1976