Effect of LaNiO3/Pt double layers on the characteristics of (PbxLa1−x)(ZryTi1−y)O3 thin films

29 April 1996

journal article
Published by AIP Publishing in Applied Physics Letters

Vol. 68 (18) , 2505-2510
https://doi.org/10.1063/1.115836

Abstract

Characteristics of LaNiO₃ (LNO) thin films deposited by rf sputtering process were compared with that prepared by pulsed laser deposition (PLD) process. rf sputtered LNO films were [200] preferentially oriented with a low surface resistivity (ρ_s=0.55 mΩ cm) and the PLD deposited films were [110] predominated with a slightly larger surface resistivity (ρ_s=6.38 mΩ cm). Using Pt coating as underneath layer markedly reduced the surface resistivity (ρ_s=0.05 mΩ cm) without modifying the texture characteristics of the LNO layers. PLZT films subsequently deposited on LNO layers inherited the texture characteristics of the underlying LNO layers. Ferroelectric properties of PLZT films were optimized when using LNO–Pt double layers as bottom electrodes. The remanent polarization and coercive force obtained were P_r=14.9 μC/cm² and E_c=3.5 kV/cm, respectively.

Keywords

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