Ultrahigh Vacuum Rapid Thermal Chemical Vapor Deposition of Epitaxial Silicon onto (100) Silicon: I . The Influence of Prebake on (Epitaxy/Substrate) Interfacial Oxygen and Carbon Levels
- 1 November 1995
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 142 (11) , 3961-3969
- https://doi.org/10.1149/1.2048442
Abstract
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