rf discharge plasma conditions in a plasma processing apparatus
- 1 January 1977
- Vol. 27 (2) , 65-67
- https://doi.org/10.1016/s0042-207x(77)80765-3
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- The chemical sputtering of graphite in an oxygen plasmaVacuum, 1976
- Nitride hardening of a molybdenum-titanium alloy by glow dischargeJournal of the Less Common Metals, 1969
- A Floating Double Probe Method for Measurements in Gas DischargesPhysical Review B, 1950