Electron cyclotron resonance ion stream etching of tantalum for x-ray mask absorber
- 1 January 1993
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 11 (1) , 37-43
- https://doi.org/10.1116/1.586723
Abstract
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