Analysis of double-exposure speckle photography with two-beam illumination
- 1 June 1974
- journal article
- Published by Optica Publishing Group in Journal of the Optical Society of America
- Vol. 64 (6) , 857-861
- https://doi.org/10.1364/josa.64.000857
Abstract
Speckle photography offers a technique for measuring small strains on an object in the presence of large displacements. An analysis is presented of this technique, which accounts for the phenomena observed and predicts its capabilities and limitations. The analysis is sufficiently general to describe either of two related techniques, one that permits measurement of strains in the absence of large displacements and one that permits measurement of large displacements alone.Keywords
This publication has 7 references indexed in Scilit:
- Analysis of Mechanical Oscillations by SpecklingApplied Optics, 1972
- A study of the use of laser speckle to measure small tilts of optically rough surfaces accuratelyOptics Communications, 1972
- Displacement Measurement from Double-exposure Laser PhotographsOptica Acta: International Journal of Optics, 1972
- Application of Speckling for In-plane Vibration AnalysisOptica Acta: International Journal of Optics, 1971
- Recording of In-plane Surface Displacement by Double-exposure Speckle PhotographyOptica Acta: International Journal of Optics, 1970
- Effects of Beam Modulation on Fringe Loci and Localization in Time-Average Hologram InterferometryJournal of the Optical Society of America, 1970
- Production of Multiple Beam Fringes from Photographic ScatterersOptica Acta: International Journal of Optics, 1968